Topaz
Northrup P A, Leinenweber K, Parise J B
American Mineralogist 79 (1994) 401-404
The location of H in the high-pressure synthetic Al2SiO4(OH)2 topaz analogue
Sample OH synthetic
_database_code_amcsd 0001643
4.7203 8.9207 8.4189 90 90 90 Pbnm
atom      x      y      z occ Biso
Al   .90499 .13210 .07984      .33
Si   .40189 .94045    .25      .29
O1    .7104  .0262    .25      .38
O2    .4439  .7561    .25      .36
O3    .2141  .9929  .0943      .38
Oh    .5906  .2507  .0659      .52
H1     .443   .199   .088  .5  2.7
H2     .607   .281   .151  .5  7.1